杨雷/刁东风等在APL发表石墨烯纳晶诱导强烈光电响应阅读次数 [1179] 发布时间 :2016-07-28 11:38:56

我所论文：Low energy electron irradiation induced carbon etching: Triggering carbon film reacting with oxygen from SiO2 substrate，发表于国际期刊Applied Physics Letters。

Nanosized graphene sheets enhanced photoelectric behavior of carbon film on p-silicon substrate  

Applied Physics Letters 109(2016), 031910

Lei Yang, Gaijuan Hu, Dongqing Zhang, and Dongfeng Diao*

We found that nanosized graphene sheets enhanced the photoelectric behavior of graphene sheets

embedded carbon (GSEC) film on p-silicon substrate, which was deposited under low energy electron irradiation in electron cyclotron resonance plasma. The GSEC/p-Si photodiode exhibited good photoelectric performance with photoresponsivity of 206 mA/W, rise and fall time of 2.2, and 4.3 ls for near-infrared (850 nm) light. The origin of the strong photoelectric behavior of GSEC film was ascribed to the appearance of graphene nanosheets, which led to higher barrier height and photoexcited electron-collection efficiency. This finding indicates that GSEC film has the potential for photoelectric applications.